nanoXFi™ Gallery
Images created using Xradia's nanoXFi™
Launched in July of 2005, Xradia’s new nanoXFi X-ray Fluorescence Imager, represents an entirely new class of x-ray imaging technology. Working in conjunction with electron beam platforms, such as scanning electron microscopes (SEM) and electron-beam metrology tools, the nanoXFi generates high-resolution, element-specific spatial maps of samples under the e-beam probe. Full resolution is maintained even through several microns of material. As you will see in the image gallery, complex structures such as integrated circuits (ICs) can be imaged in such a way as to reveal structural details through several layers of metal interconnects, for example. By selecting and focusing specific wavelengths, elemental structures can be imaged in high-resolution detail, one element at a time, non-destructively and non-invasively.
New applications are constantly emerging for high-resolution fluorescence imaging, including semiconductor metrology, failure analysis, geological studies and advanced materials research. Click on “Related Links” to learn more about this exciting new imaging technology.
Die-level Copper / Aluminum Interconnect Failure Analysis and Metrology
High-resolution Elemental Analysis Of Phase Separation In Composite Materials

